PECVD for Crystalline Solar Cell

SiNA PECVD

(Plasma Enhanced Chemical Vapour Deposition) of silicon nitride (SiN) layers has been introduced into the most production lines as the standard for antireflective coating and passivation of crystalline silicon solar cells. By means of surface and bulk passivation of the silicon wafer - resulting from the hydrogenated SiN coating - a significant improvement of the cell efficiency in the range of 10% could be achieved.

With the SiNA® series, consisting of different 6 models, Roth & Rau offers SiN coating equipment for various throughput requirements ranging from pilot manufacturing to mass production. SiNA® systems are in-line systems in which the wafers are processed on flat carriers. The SiN layers are deposited in a continuously operating process from a silane / ammonia plasma using a special kind of plasma sources. Basing on comprehensive process optimisation and longstanding experiences under production conditions the SiN layers develop excellent optical and passivation properties. The technology is flexible in terms of wafer sizes and shapes. SiNA® systems can be easily integrated into various automation concepts, have low running costs and achieve a high production up-time SiNA® systems are capable of implementation of future technologies like combination with dry PSG removal, both-side passivation, gradient or double layer structures, handling of thin wafers and more.

IN LINE Dry Etching

Plasma etching has various advantages over the so far used wet chemical etching techniques, such as saving of chemicals and a better environmental sustainability. Basing on the design-engineering platform of the in-line PECVD systems Roth & Rau offers in-line plasma etching equipment for texturing and PSG removal. These systems are compatible with the SiN deposition tools in terms of throughput and wafer handling. Both systems together form a new, alternative front end solution for future solar cell manufacturing line concepts.

PLASMA Technology for Thin Film Solar Cell

LAiLA

• In-line production facility for the hydrogen plasma treatment of amorphous silicon layers on glass substrates
• Module size to 1.3 m x 1.1 m
• High density plasma with a low ion energy for a damage-free process by the use of microwave-activated remote plasma sources

Flexi Coat

Hydrogen passivation equipment for thin film solar modules

• Roll to Roll plasma process systems for application CIS/CIGS thin film solar cell manufacturing
• Configurale for various techniques such as magnetron sputtering, electron beam evaporation and plasma treatment for surface conditioning
• Also available for PECVD techniques for deposition of silicon based layers or layer stacks.

Our Turn Key offer includes:

• Integrated equipment and technology package
• Factory layout assistance
• Equipment Installation and start up assistance
• Technology transfer and production ramp up support
• Training of staff
• After sales service and support in spare parts logistic